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Improvement in cyclic operation of unit pixel device using Sb-excess Ge_2Sb_2Te_5 thin films for hologram image implementation

机译:使用Sb过量Ge_2Sb_2Te_5薄膜实现全息图像实现的单位像素器件循环操作的改进

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摘要

The effects of the atomic composition of Ge2Sb2Te5 (GST), especially the Sb-excess phase, on device reliability were investigated for applications of spatial light modulator (SLM) devices using phase-change materials. Sb-excess GST phases were prepared by cosputtering with two target systems. For Sb-excess GST thin films, amorphous phases were found to be more directly crystallized to more conductive hexagonal-close-packing phases at higher crystallization temperatures without the appearance of a less conductive face-centered-cubic phase with increasing amount of incorporated Sb. The marked changes in crystallization behavior and improved thermal stability were suggested as critical benefits for enhancing the device durability during cyclic operations, considering that the interdiffusion within the GST could be the main origin of the final device failure. The number of cyclic operations of the unit pixel device was markedly improved to more than 10(3) when the amount of excess Sb was modulated from 0 to 21 at. %. (C) 2018 The Japan Society of Applied Physics
机译:对于使用相变材料的空间光调制器(SLM)器件的应用,研究了Ge2Sb2Te5(GST)的原子组成(尤其是Sb过剩相)对器件可靠性的影响。通过与两个目标系统共溅射制备了过量的锑消费税阶段。对于过量Sb的GST薄膜,发现在较高的结晶温度下,非晶相会更直接地结晶为更具导电性的六方密堆积相,而随着掺入Sb的增加,不会出现导电性较低的面心立方相。考虑到GST内的相互扩散可能是最终器件故障的主要根源,因此结晶行为的显着变化和改善的热稳定性被认为是提高循环操作期间器件耐用性的关键优势。当过量的Sb的量从0调制到21at时,单位像素器件的循环操作数被显着提高到大于10(3)。 %。 (C)2018日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2018年第8期|082201.1-082201.6|共6页
  • 作者单位

    Kyung Hee Univ, Dept Adv Mat Engn Informat & Elect, Yongin 17104, Gyeonggi, South Korea;

    Elect & Telecommun Res Inst, ICT Mat & Components Res Lab, Daejeon 34129, South Korea;

    Elect & Telecommun Res Inst, ICT Mat & Components Res Lab, Daejeon 34129, South Korea;

    Elect & Telecommun Res Inst, ICT Mat & Components Res Lab, Daejeon 34129, South Korea;

    Elect & Telecommun Res Inst, ICT Mat & Components Res Lab, Daejeon 34129, South Korea;

    Elect & Telecommun Res Inst, ICT Mat & Components Res Lab, Daejeon 34129, South Korea;

    Elect & Telecommun Res Inst, ICT Mat & Components Res Lab, Daejeon 34129, South Korea;

    Kyung Hee Univ, Dept Adv Mat Engn Informat & Elect, Yongin 17104, Gyeonggi, South Korea;

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