首页> 外文期刊>Iranian Journal of Chemistry and Chemical Engineering >Cd (Ⅱ) Removal from Aqueous Solutions by Adsorption on Henna and Henna with Chitosan Microparticles Using Response Surface Methodology
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Cd (Ⅱ) Removal from Aqueous Solutions by Adsorption on Henna and Henna with Chitosan Microparticles Using Response Surface Methodology

机译:响应面法吸附壳聚糖微粒在指甲花和指甲花中吸附去除水中的镉(Ⅱ)

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In this research, the capabilities of Henna and Henna with chitosan microparticles adsorbents were studied in order to remove the ion Cd (II). Response Surface Method (RSM) and Central Composite Design (CCD) were used to minimize the number of experiments (21 runs) for Henna and (26 runs) for the Henna with chitosan microparticles. The parameters were pH (2-9), initial solution concentration [10-100 mg/L (ppm)], adsorbent dosage (0.1-1 g) and process time (20-150 min). It was concluded that Cd (II) removal increased from 13.78% to 70.06% with increasing the pH from 2 to 9 (maximum adsorption was at pH 9) for Henna and 82.81% to 97.60% for the Henna with chitosan microparticles. The Cd (II) removal was decreased from 78.73% to 40.44% for Henna and 96.47% to 90.37% for the Henna with chitosan microparticles with increasing the initial solution concentration (from 10 to 100 ppm). Furthermore, the Cd (II) removal was increased from 37.5% to 64.59% for Henna and from 86.74% to 97.76 % for the Henna with chitosan microparticles with the adsorbent dosage increment (from 0.1 to 1 g). The error for the optimum point between the statistical data and experimental ones were at 1.53% for Henna and at 1.61% for the Henna with chitosan microparticles. The Langmuir and Freundlich isotherm models were applied as the adsorption mechanism. Two correlations (with R-2 =0.9750 for Henna and R-2 =0.8538 for the Henna with chitosan microparticles) between the Langmuir model and experimental data were investigated although Freundlich model showed the better agreements between the theoretical data and experimental ones (R-2 =0.9949 for Henna and R-2 =0.9955 for the Henna with chitosan microparticles). It also showed that the Henna with chitosan microparticles is a fantastic adsorbent for Cd (II) removal.
机译:在这项研究中,研究了指甲花和指甲花具有脱乙酰壳多糖微粒吸附剂的能力,以去除Cd(II)离子。使用响应面法(RSM)和中央复合设计(CCD)来最大程度地减少使用壳聚糖微粒的指甲花的实验次数(21次)和指甲花的实验次数(26次)。参数为pH(2-9),初始溶液浓度[10-100 mg / L(ppm)],吸附剂剂量(0.1-1 g)和处理时间(20-150分钟)。结论是:对于具有壳聚糖微粒的指甲花,随着pH从2增至9(最大吸附在pH 9),Cd(II)的去除率从13.78%增至70.06%,对于指甲花,指甲花的脱除率从82.81%增至97.60%。随着壳聚糖微粒的加入,随着初始溶液浓度的增加(从10 ppm到100 ppm),Cenna(II)的去除率从Henna的78.73%降至40.44%,Henna的96.47%降至90.37%。此外,具有壳聚糖微粒且吸附剂剂量增加(0.1到1 g)的指甲花中的Cd(II)去除率从指甲花中的37.5%提高到64.59%,指甲花中的Cd(II)去除率从86.74%增加到97.76%。统计数据和实验数据之间的最佳点误差对于Henna为1.53%,对于具有壳聚糖微粒的Henna为1.61%。 Langmuir和Freundlich等温模型被用作吸附机理。尽管Freundlich模型显示出理论数据与实验数据之间的较好一致性,但研究了Langmuir模型与实验数据之间的两个相关性(R-2 = 0.9750,指甲红R-2 = 0.8538,指甲花R-2 = 0.8538)(R-对于具有壳聚糖微粒的指甲花,Henna为2 = 0.9949,对于指甲花R-2 = 0.9955)。这也表明,具有壳聚糖微粒的指甲花染料是去除Cd(II)的绝佳吸附剂。

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