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A comparative study of flow boiling HFE-7100 in silicon nanowire and plainwall microchannels

机译:硅纳米线和平壁微通道中沸腾HFE-7100的比较研究

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摘要

Extensive experimental investigations along with high speed visualizations have been performed to assess the flow boiling characteristics in Silicon Nanowire (SiNW) microchannels. Experiments have been also performed in Plainwall microchannels to compare their performances with SiNW configurations. HFE-7100 has been used as the working fluid and experiments are conducted in a forced convection loop at mass flux range of 400-1600 kg/m(2)s. Arrays of microchannel consist 5 (five) parallel straight microchannels with Width, Depth and Length dimension of 220 mu m, 250 mu m and 10 mm respectively. Flow boiling performances including heat transfer coefficient (HTC), pressure drop, two-phase flow instabilities and critical heat flux (CHF) have been studied in both the Silicon plainwall (smooth inner surface) and Silicon Nanowire (silicon nanostructured inner surface) microchannels. High speed flow visualizations have been performed at up to 70,000 frames per s (fps) to understand the difference in boiling mechanisms between Plainwall and SiNW. SiNW performs significantly enhanced HTC (up to 400% improvement), reduces flow boiling instabilities and pressure drop (up to 70% reduction) compared to Plainwall microchannels. However, little/insignificant effect of nanostructured surface has been observed on CHF. In addition, a major difference in two-phase flow regime development has been observed between the SiNW and Plainwall microchannels during flow visualization. Specifically, SiNWs introduce explosive bubble nucleation, reduce intermittent flow regimes (slug/churn), improve rewetting, maintain thin liquid film and thus, improve system performances. (C) 2018 Elsevier Ltd. All rights reserved.
机译:已经进行了广泛的实验研究以及高速可视化,以评估硅纳米线(SiNW)微通道中的沸腾特性。还已经在Plainwall微通道中进行了实验,以将其性能与SiNW配置进行比较。 HFE-7100已用作工作流体,并且在强制对流回路中以400-1600 kg / m(2)s的质量通量范围进行了实验。微通道阵列由5个(五个)平行的直线微通道组成,宽度,深度和长度尺寸分别为220μm,250μm和10 mm。在硅平壁(光滑的内表面)和硅纳米线(硅纳米结构的内表面)微通道中都研究了流沸腾性能,包括传热系数(HTC),压降,两相流动不稳定性和临界热通量(CHF)。高速流可视化已以每秒70,000帧(fps)的速度执行,以了解Plainwall和SiNW之间沸腾机制的差异。与Plainwall微通道相比,SiNW显着增强了HTC(提高了400%),减少了流沸腾的不稳定性和压降(降低了70%)。然而,已经观察到纳米结构表面对CHF几乎没有影响。此外,在流动可视化过程中,已在SiNW和Plainwall微通道之间观察到两相流态发展的主要差异。具体而言,SiNW会引入爆炸性气泡成核作用,减少间歇流动状态(弹塞/搅动),改善再润湿,保持薄液膜,从而改善系统性能。 (C)2018 Elsevier Ltd.保留所有权利。

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