An annealing system with a novel electronic control unit and a glass-to-metal connection was custom built, which enables the researcher to anneal samples in an Ar gas atmosphere at pressures above atmosphere, is described. The system uses standard vacuum connections and fittings, it registers the annealing time, and it also compares a custom-set pressure to a measured gauge pressure and switches the power to a furnace accordingly. A tightness check on the system indicates a maximum Ar leak rate of 1Â ÃÂ 10â13Â Torr.l.sâ1. Bi-doped Cu polycrystalline samples were annealed in a tube backfilled with Ar. X-ray photoelectron spectroscopy (XPS) analyses on these samples confirm the success of the pressurized annealing system.View full textDownload full textKeywordsannealing system, Bi segregation, thermal diffusionRelated var addthis_config = { ui_cobrand: "Taylor & Francis Online", services_compact: "citeulike,netvibes,twitter,technorati,delicious,linkedin,facebook,stumbleupon,digg,google,more", pubid: "ra-4dff56cd6bb1830b" }; Add to shortlist Link Permalink http://dx.doi.org/10.1080/10739149.2010.508309
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