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Understanding the Mechanisms of Degradation and Failure Observed in ESD Protection Devices Under System-Level Tests

机译:了解在系统级测试中在ESD保护设备中观察到的退化和故障机制

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The behavior and the failure mechanism of a monolithic bidirectional ESD protection device under a system-level ESD pulse are investigated. The device is realized by two diffused vertical back-to-back connected diodes. When the bottom p-n junction is stressed with an 18-kV system-level pulse, the device exhibited the typical signature of second thermal breakdown. Surprisingly, no ESD damage could initially be observed by measuring the poststress leakage current, even when the ESD level was further increased to 30 kV. A degrading $IV$ behavior was later found to be associated with the second thermal breakdown. Based on simulations, local crystal defects are proposed to explain the observed degradation of the $IV$ behavior. It is shown that, in this case, leakage-current measurements alone fail to detect such ESD damage. Failure analysis of the device confirms the existence of the crystal damage.
机译:研究了单片双向ESD保护器件在系统级ESD脉冲下的行为和失效机理。该器件由两个扩散的垂直背对背连接的二极管实现。当底部p-n结受到18kV系统级脉冲的应力时,该器件表现出二次热击穿的典型特征。出人意料的是,即使将ESD等级进一步提高到30 kV,通过测量后应力泄漏电流也不会最初观察到ESD损害。后来发现劣化的$ IV $行为与第二次热击穿有关。基于模拟,提出了局部晶体缺陷来解释观察到的$ IV $行为的退化。结果表明,在这种情况下,仅泄漏电流测量无法检测到这种ESD损坏。器件的故障分析证实了晶体损坏的存在。

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