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首页> 外文期刊>IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems >Electrical model of the floating gate defect in CMOS ICs: implications on I/sub DDQ/ testing
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Electrical model of the floating gate defect in CMOS ICs: implications on I/sub DDQ/ testing

机译:CMOS IC中浮栅缺陷的电气模型:对I / sub DDQ /测试的影响

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The behavior of an MOS transistor with an open in the polygate path (floating transistor gate defect) is investigated and its effect on the quiescent power supply current I/sub DDQ/ is studied. The possible detection of this defect by current testing is explored in fully complementary CMOS circuits. The behavior of a transistor with its floating gate is modeled using the coupling capacitances in the floating gate and the charge in the transistor gate. The poly-bulk and metal-poly capacitances are found to be two significant parameters in determining the degree of conduction on the affected transistor. The induced voltage in the floating gate and the quiescent current are estimated by analytical expressions. The model is compared with SPICE 2 simulations. Good agreement is observed between the simple analytical expressions, simulations and experimental measures performed on defective circuits. In addition, it is shown that the floating gate transistor can be modeled as a weakly conductive stuck-on transistor or as a stuck-open transistor depending on the values of the parameters characterizing the defect.
机译:研究了在多晶硅栅极路径中开路的MOS晶体管的行为(浮动晶体管栅极缺陷),并研究了其对静态电源电流I / sub DDQ /的影响。在完全互补的CMOS电路中探索了通过电流测试对这种缺陷的可能检测。使用浮置栅极中的耦合电容和晶体管栅极中的电荷来模拟具有浮置栅极的晶体管的行为。发现多晶硅电容和金属多晶硅电容是确定受影响晶体管上的导电程度的两个重要参数。浮栅中的感应电压和静态电流通过解析表达式估算。该模型与SPICE 2仿真进行了比较。在简单的分析表达式,仿真和对有缺陷的电路执行的实验措施之间观察到良好的一致性。另外,示出了可以根据表征缺陷的参数的值将浮栅晶体管建模为弱导电的粘附晶体管或粘附断开晶体管。

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