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首页> 外文期刊>IEEE transactions on circuits and systems . I , Regular papers >SRAM Operational Mismatch Corner Model for Efficient Circuit Design and Yield Analysis
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SRAM Operational Mismatch Corner Model for Efficient Circuit Design and Yield Analysis

机译:用于高效电路设计和良率分析的SRAM操作失配角模型

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摘要

A static random access memory (SRAM) operational mismatch (SOMM) corner model and a methodology to efficiently estimate the SRAM read and write stability yield with the SOMM corner model are proposed. The proposed SOMM corner model effectively finds the combination of the transistor mismatch in SRAM, which represents the worst SRAM read or write operation in the given probabilistic distance (e.g., six sigma), and the SRAM yield can be estimated from the smallest probabilistic distance at which read or write operation failure occurs. With the proposed SOMM corner model implemented in the process design kit, the circuit designers can optimize the SRAM design by estimating the SRAM yield with significantly fewer computational resources, compared with the previous Monte Carlo-based methodologies. Numerical experiments show that the yield estimated by the proposed methodology matches well with the yield by Monte Carlo with importance sampling (error <; 0.1 sigma); the simulation time takes less than 1 min, which is three orders of magnitude speedup over the conventional importance sampling methods.
机译:提出了一种静态随机存取存储器(SRAM)操作失配(SOMM)角模型,以及一种利用SOMM角模型有效估计SRAM读写稳定性的方法。所提出的SOMM转角模型有效地找到了SRAM中晶体管失配的组合,这代表了在给定的概率距离(例如,六个sigma)中最差的SRAM读或写操作,并且SRAM的良率可以从最小的概率距离估算得出。发生读或写操作失败。与以前的基于蒙特卡洛的方法相比,利用在工艺设计套件中实现的拟议SOMM角模型,电路设计人员可以通过以显着更少的计算资源估算SRAM产量来优化SRAM设计。数值实验表明,所提方法的收益率与重要抽样的蒙特卡洛法的收益率非常吻合(误差<; 0.1 sigma)。仿真时间不到1分钟,比传统的重要性采样方法快了三个数量级。

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