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Device Scaling Considerations for Nanophotonic CMOS Global Interconnects

机译:纳米光子CMOS全局互连的设备扩展注意事项

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摘要

We introduce an analytical framework to understand the path for scaling nanophotonic interconnects to meet the energy and footprint requirements of CMOS global interconnects. We derive the device requirements for sub-100 fJ/cm/bit interconnects including tuning power, serialization–deserialization energy, and optical insertion losses. Using CMOS with integrated nanophotonics as an example platform, we derive the energy/bit, linear, and areal bandwidth density of optical interconnects. We also derive the targets for device performance which indicate the need for continued improvements in insertion losses (40 Gb/s), tuning power (6 channels).
机译:我们介绍了一个分析框架,以了解缩放纳米光子互连的路径,以满足CMOS全局互连的能量和占位要求。我们得出了低于100 fJ / cm / bit互连的设备要求,包括调谐功率,串行化-反序列化能量和光学插入损耗。使用具有集成纳米光子学的CMOS作为示例平台,我们得出光互连的能量/位,线性和面带宽密度。我们还得出了设备性能的目标,这些目标表明需要持续改善插入损耗(40 Gb / s),调谐功率(6通道)。

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