${rm BaAlBO}_{3}{rm F}_{2}$ (BABF) using Z-sc'/> Polarization-Dependent Third-Order Optical Nonlinearity of Crystal
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Polarization-Dependent Third-Order Optical Nonlinearity of Crystal

机译:晶体的偏振相关的三阶光学非线性

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We investigated the third-order optical nonlinearity of a new nonlinear optical crystal ${rm BaAlBO}_{3}{rm F}_{2}$ (BABF) using Z-scan technique with a picosecond 532-nm laser. Polarization-dependent nonlinear refractive index $gamma$ of the BABF crystal was measured with an a-cut sample and a sample cut along the type I phase-matching angle for third-harmonic-generation of lasers at 1064 nm (THG-cut). Anisotropy was observed with positive $gamma$ values in the range of $10^{-16}~{rm cm}^{2}/{rm W}$, indicating self-focusing Kerr effects. The measurements agreed well with the theoretical prediction. The corresponding third-order nonlinear optical susceptibility $chi_{eff}^{(3)}$ was estimated to be ${sim} 10^{-14}~{rm esu}$.
机译:我们研究了一种新的非线性光学晶体的三阶光学非线性<公式>,{rm BaAlBO} _ {3} {rm F} _ {2} $ (BABF)使用皮秒532 nm激光的Z扫描技术。用a切割样品和沿b切割的样品测量BABF晶体的偏振相关非线性折射率 $ gamma $ I型相位匹配角,用于在1064 nm处产生三次谐波(THG切割)。在<公式公式类型=“ inline”> $ 10 ^ {-16}〜{rm cm} ^ {2} / {rm W} $ ,表示自聚焦Kerr效应。测量结果与理论预测吻合良好。相应的三阶非线性光学磁化率<公式公式类型=“ inline”> $ chi_ {eff} ^ {(3)} $ 估计为<公式Formulatype =“ inline”> $ {sim} 10 ^ {-14}〜{rm esu} $

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