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Material Gain Analysis of GeSn/SiGeSn Quantum Wells for Mid-Infrared Si-Based Light Sources Based on Many-Body Theory

机译:基于多体理论的中红外硅基光源GeSn / SiGeSn量子阱的材料增益分析

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摘要

Material gain of GeSn/SiGeSn quantum wells, which can be grown on Si substrate using a buffer layer, is analyzed based on microscopic many-body theory (MBT) for mid-infrared light sources based on Si photonics. MBT can consider a gain spectrum broadening associated with scattering phenomena, such as Coulomb scattering, based on quantum field theory, and does not need any artificial fitting parameters, such as a relaxation time, used in conventional analysis. Not only - but also carrier distributions in L-points are considered for the gain analysis. Using MBT, the quantum well structures maximizing the material gain and the differential gain at the threshold are investigated in terms of the well thickness, the strain, and the energy difference of quantum states between - and L-points.
机译:基于微观光子多体理论(MBT),针对基于Si光子学的中红外光源,分析了可以利用缓冲层在Si衬底上生长的GeSn / SiGeSn量子阱的材料增益。 MBT可以基于量子场论考虑与散射现象(例如库仑散射)相关的增益谱展宽,并且不需要常规分析中使用的任何人工拟合参数(例如弛豫时间)。不仅要进行增益分析,还要考虑L点的载波分布。使用MBT,根据阱厚度,应变以及-和L点之间的量子态的能量差,研究了使材料增益和阈值处的微分增益最大化的量子阱结构。

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