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Photocarrier Escape Time in Quantum-Well Light-Absorbing Devices: Effects of Electric Field and Well Parameters

机译:量子阱光吸收器件中的光子逸出时间:电场和阱参数的影响

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摘要

We analyze the dependence of the carrier escape time from a single-quantum-well optoelectronic device on the aplied electric field and well width and depth. For this purpose, a new simple and computationally efficient theory is developed. This theory is accurate in the case of electrons, and the assessment of the applicability for holes is given. Semi-analytical expressions for the escape times are derived. Calculations are compared to experimental results and previous numerical simulations. Significant correlations between the position of quantum-well energy levels and the value of the escape time are found. The main escape mechanism at room temperature is established to be thermally assisted tunneling/emission through near-barrier-edge states. The formation of a new eigenstate in the near-barrier-edge energy region is found to reduce the electron escape time significantly, which can be used for practical device optimization.
机译:我们分析了单量子阱光电器件的载流子逸出时间对所施加电场以及阱宽度和深度的依赖性。为此,开发了一种新的简单且计算效率高的理论。对于电子,该理论是准确的,并给出了空穴适用性的评估。导出了逃逸时间的半解析表达式。将计算结果与实验结果和先前的数值模拟进行比较。发现量子阱能级的位置与逸出时间的值之间具有显着的相关性。建立室温下的主要逸出机制是通过近障碍边缘状态进行热辅助隧穿/发射。发现在近势垒边缘能量区域中形成新的本征态可显着减少电子逸出时间,可将其用于实际的器件优化。

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