Nanoscale characterization of wood photodegradation using atomic force microscopy

摘要

Atomic force microscopy (AFM) can image materials at the nanometer scale and obtain quantitative information on their surface energy, roughness and hardness (Morris et al. 1999). AFM has also been used to quantify changes in the surface properties of polymer films and coatings exposed to UV radiation or natural weathering, but it has not been used to assess the photodegradation of wood (Biggs et al. 2001). The advantage of using AFM to assess the photodegradation of polymers lies in its ability to reveal early changes in the material on a nanometer scale and elucidate mechanisms responsible for such degradation. This study examined if AFM could provide similar information and insights for wood exposed to solar radiation.