...
机译:大约2微米的InGaAs / InGaAsP / InP应变层量子阱激光器
Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA;
III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; semiconductor epitaxial layers; semiconductor junction lasers; semiconductor quantum wells; vapour phase epitaxial growth; -1 V; 2 micron; 20 muA; 5 micron; 6 percent; 800 micron; InGaAs-InGaAsP-InP; InP substrates; epitaxial layers; external differential quantum efficiency; injection lasers; low defect density; operation; reverse leakage current; ridge waveguide lasers; semiconductors; strained-layer quantum well lasers; threshold current density;
机译:高性能/ spl lambda / = 1.3 / spl mu / m InGaAsP-InP应变层量子阱激光器
机译:1.3μmInGaAsP / InP应变层多量子阱DFB激光器的线宽增强因子
机译:单量子阱应变层InGaAs-InGaAsP激光器,波长范围为1.43至1.55μm
机译:低透明电流密度,高增益1.3- / splμm/ m应变层InGaAsP / InP量子阱激光材料
机译:InGaASP-INP多量子孔激光器的功率和光谱表征
机译:通过采用光学光谱分程利用基于INP的量子级联激光器的InGaAs层的非接触式测量
机译:应变层多量子阱InGaAsP / InP激光器高温效应的自洽分析
机译:有机金属气相外延生长的应变层InGaas(p)/ Inp量子阱半导体激光器