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Anomalous drain-induced barrier lowering effect of thin-film transistors due to capacitive coupling voltage of light-shield metal

机译:遮光金属的电容耦合电压引起的薄膜晶体管漏极引致的势垒降低异常效应

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摘要

The anomalous drain-induced barrier lowering (DIBL) effect of longchannel thin-film transistors (TFTs) with a light shield (LS) is investigated by two-dimensional (2D) device simulation. In long-channel TFTs with a LS, which is long enough to neglect the DIBL effect and the floating body effect, a decrease of threshold voltage (Vth) was observed at high drain voltages. The Vth lowering is due to the large potential of the LS induced by the high drain voltage, which lowers the height of the source potential barrier. It is found that the LS-induced DIBL effect can be larger as the length of the LS increases or the thickness of the buried oxide decreases.
机译:通过二维(2D)器件仿真研究了带有遮光罩(LS)的长沟道薄膜晶体管(TFT)的异常漏极诱导势垒降低(DIBL)效应。在具有足以忽略DIBL效应和浮体效应的LS的长沟道TFT中,在高漏极电压下观察到阈值电压(V )减小。 V th 的降低是由于高漏极电压引起的LS的大电势,从而降低了源极势垒的高度。发现随着LS的长度增加或掩埋氧化物的厚度减小,LS诱导的DIBL效应可以更大。

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  • 来源
    《Electronics Letters》 |2014年第15期|1093-1095|共3页
  • 作者

    Kim M.; Shin H.;

  • 作者单位

    Ewha Womans University, Republic of Korea;

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  • 正文语种 eng
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