Directed self-assembly pilot line ramps at IMEC By Peter Clarke

摘要

Europe's interuniversity Microelectronics Center has co-developed a directed self-assembly (DSA) manufacturing process to improve both optical and extreme-ultraviolet lithography, and has installed a 300-mm-compatible DSA-based manufacturing line within its pilot fab. IMEC announced details of its successful implementation of DSA at the SPIE Advanced Lithography conference last week in San Jose, Calif. DSA makes use of natural processes within materials to produce ordered structures.