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首页> 外文期刊>IEEE Transactions on Electron Devices >OMVPE-grown InAlAs/InGaAs/InP MODFET's with performance comparable to those grown by MBE
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OMVPE-grown InAlAs/InGaAs/InP MODFET's with performance comparable to those grown by MBE

机译:OMVPE生长的InAlAs / InGaAs / InP MODFET具有与MBE增长的性能相当的性能

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摘要

The current-gain cutoff frequency (f/sub T/) performances of InAlAs/InGaAs/InP MODFETs on OMVPE-grown heterostructures and MBE-grown heterostructures are compared. InAlAs/InGaAs/InP MODFETs on OMVPE-grown heterostructures were fabricated with different gate lengths from 2.5 to 0.27 mu m. An effective electron saturation velocity of 2.0*10/sup 7/ cm/s is deduced from an f/sub T/*L/sub g/ product of 32 GHz- mu m. An extrinsic DC transconductance as high as 1020 mS/mm and an f/sub T/ of over 114 GHz at room temperature were achieved for 0.27- mu m gate-length MODFETs. It is shown that the device characteristics obtained at all gate lengths compare favorably with the best results reported in the literature for MODFETs on heterostructures grown by MBE.
机译:比较了InAlAs / InGaAs / InP MODFET在OMVPE生长的异质结构和MBE生长的异质结构上的电流增益截止频率(f / sub T /)性能。在OMVPE生长的异质结构上制造的InAlAs / InGaAs / InP MODFET的栅极长度从2.5到0.27μm不等。从32GHz-μm的f / sub T / * L / sub g /乘积推导出有效的电子饱和速度2.0 * 10 / sup 7 / cm / s。对于0.27μm栅长的MODFET,在室温下可获得高达1020 mS / mm的非本征直流跨导和超过114 GHz的f / sub T /。结果表明,在所有栅极长度下获得的器件特性均与文献报道的关于MBE生长的异质结构上的MODFET的最佳结果相吻合。

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