Accurate Modeling of Thermal Resistance for On-Wafer SiGe HBTs Using Average Thermal Conductivity

摘要

An accurate analytic model is proposed for estimating the junction temperature and thermal resistance in silicon–germanium heterojunction bipolar transistors (SiGe HBTs) including the back-end-of-line (BEOL) metal layers. The model uses an average value of thermal conductivity in order to include the temperature dependence of thermal resistance. The parameters corresponding to the thermal conductivity and the BEOL thermal resistance used in the model are extracted following a recently reported methodology. The proposed model is scalable in nature and verification with experimental data shows an excellent accuracy across different emitter geometries of SiGe HBTs fabricated in STMicroelectronics B9MW technology. Compact model simulations show that the proposed model simulates around 23% faster compared with an existing state-of-the-art iterative method.