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Steep Switching Hybrid Phase Transition FETs (Hyper-FET) for Low Power Applications: A Device-Circuit Co-design Perspective–Part I

机译:适用于低功率应用的陡峭开关混合相变FET(Hyper-FET):器件-电路协同设计的观点–第一部分

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摘要

Hybrid-phase-transition FETs (Hyper-FETs) are recently proposed steep switching devices that utilize the phase transition materials (PTM) to achieve a boost in the ratio of ON ( ION) and OFF currents ( IOFF) . Prototypical demonstrations of the Hyper-FET have shown performance improvement in comparison with conventional transistors, which motivates the evaluation of its device-circuit design space. In part I, we analyze the device aspects establishing the effects of the resistivity and phase transition thresholds of the PTM on the characteristics of Hyper-FETs. Our analysis shows that the ratio of insulating and metallic state resistivity ( ρINS and ρMET, respectively) of the PTM needs to be higher than the ION/IOFF of its host transistor to achieve performance improvement in Hyper-FET. For a host transistor with IOFF=0.051μA/μm and ION=191.5μA/μm , ρMET<∼2×10−3Ω .cm and ∼7.5 Ω .cm <ρINS<20000Ω .cm is required to achieve proper device functionality with a boost in ION/IOFF . Additionally, we establish the ranges of phase transition thresholds that yield proper functionality of the Hyper-FETs considering different IOFF targets. The methodology of choosing appropriate PTM geometry to achieve the target device characteristics is also described. We show that with proper design, Hyper-FETs achieve 94% larger ION at iso- IOFF compared with a FinFET. We examine the circuit design aspects of Hyper-FET in part II.
机译:最近提出了混合相变FET(Hyper-FET)陡峭的开关器件,该器件利用相变材料(PTM)来实现导通电流(ION)和截止电流(IOFF)之比的提升。与传统晶体管相比,Hyper-FET的原型演示显示出了性能上的改进,这激发了对其器件电路设计空间的评估。在第一部分中,我们分析了器件方面,建立了PTM的电阻率和相变阈值对Hyper-FET的特性的影响。我们的分析表明,PTM的绝缘电阻率和金属态电阻率之比(分别为INS和ρMET)需要高于其主晶体管的ION / IOFF才能实现Hyper-FET的性能改善。对于IOFF =0.051μA/μm和ION =191.5μA/μm的主晶体管,需要ρMET<〜2×10-3Ω.cm和7.5Ω.cm<ρINS<20000Ω.cm,以实现具有提高ION / IOFF。此外,考虑到不同的IOFF目标,我们建立了可产生Hyper-FET正常功能的相变阈值范围。还介绍了选择合适的PTM几何形状以实现目标器件特性的方法。我们证明,通过适当的设计,与FinFET相比,Hyper-FET在iso-IOFF处的离子强度大94%。我们在第二部分中检查了Hyper-FET的电路设计方面。

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