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Hot-Electron Trapping and Hole-Induced Detrapping in GaN-Based GITs and HD-GITs

机译:GaN基GIT和HD-GIT中的热电子陷阱和空穴诱导去陷阱

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This paper investigates the trapping mechanisms in gate-injection transistors (GITs) without and with a pdrain electrode, referred to as GITs and Hybrid-Drain-embedded GITs (HD-GITs), respectively, used to inject holes and reduce charge trapping effects. We compare the two sets of devices under both the OFF-state and semi- ON state, to investigate the role of hot electrons in favoring the charge trapping. The analysis is based on combined pulsed characterization, transient measurements, and electroluminescence (EL) characterization. We demonstrate the following relevant results: 1) GITs and HD-GITs have comparable and negligible dynamic${R}_{ mathrm{scriptscriptstyle ON}}$when trapping is induced in the OFF-state; under semi- ON state conditions, GITs suffer from significant dynamic${R}_{ mathrm{scriptscriptstyle ON}}$, while HD-GITs show no additional trapping with respect to OFF-state; 2) EL characterization carried out until${V}_{mathsf {DS}}= 500$V in semi- ON conditions shows comparable features, suggesting that the electric field and hot-carrier density are similar in GITs and HD-GITs. This result indicates that the hot-electron trapping rate is identical for the two sets of samples, so the difference observed in dynamic${R}_{ mathrm{scriptscriptstyle ON}}$must be ascribed to a different detrapping rate; 3) transient${R}_{ mathrm{scriptscriptstyle ON}}$measurements indicate that the traps filled in the OFF-state conditions are the same as those filled by hot electrons in semi- ON, with${E}_{a}= 0.8$eV (possibly${C}_{N}$); and 4) EL analysis under constant bias indicates that in GITs there is a time-dependent increase in the luminescence signal at the drain terminal, when the devices are biased with${V}_{mathsf {DS}}= 300$V. Such effect, indicative of hot-electron trapping, is not observed in HD-GITs. Based on the experimental evidence collected within this paper, we conclude that—in the semi- ON state—the main difference between GITs and HD-GITs consists in a faster detrapping rate of hot electrons, achieved through hole injection from the pdrain terminal.
机译:本文研究了无栅电极和栅电极的栅注入晶体管(GIT)中的俘获机制,分别称为GIT和嵌入式漏极嵌入式GIT(HD-GIT),用于注入空穴并降低电荷俘获效应。我们比较了处于关闭状态和半开启状态的两组器件,以研究热电子在促进电荷俘获中的作用。该分析基于组合的脉冲表征,瞬态测量和电致发光(EL)表征。我们证明了以下相关结果:1)GIT和HD-GIT具有可比较且可忽略的动态 n $ {R} _ { mathrm { scriptscriptstyle ON}} $ < / tex-math> n(当在OFF状态下诱捕时);在半开启状态条件下,GIT遭受很大的动态 n $ {R} _ { mathrm { scriptscriptstyle ON}} $ n,而HD-GIT相对于OFF状态没有其他陷阱; 2)进行EL表征,直到 n $ {V} _ { mathsf {DS}} = 500 $ nV在半导通状态下,显示出可比较的特征,这表明GIT和HD-GIT中的电场和热载流子密度相似。此结果表明,两组样品的热电子俘获速率相同,因此在动态 n $ {R} _ { mathrm { scriptscriptstyle ON}} $ n必须归因于不同的释放率; 3)瞬态 n <内联公式xmlns:mml = “ http://www.w3.org/1998/Math/MathML ” xmlns:xlink = “ http://www.w3.org/1999/ xlink “> $ {R} _ { mathrm { scriptscriptstyle ON}} $ n测量表明在关闭状态条件下填充的陷阱与在半打开状态下由热电子填充的陷阱相同,其中 n $ {E} _ {a} = 0.8 $ neV(可能 n $ {C} _ {N} $ n) ;和4)在恒定偏置下的EL分析表明,当器件使用 n $ {V } _ { mathsf {DS}} = 300 $ nV。在HD-GIT中未观察到这种指示热电子俘获的效应。根据本文收集的实验证据,我们得出结论,在半导通状态下,GIT和HD-GIT之间的主要区别在于,通过从p漏极端子注入空穴实现了更快的热电子脱俘速率。

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