首页> 外文期刊>Electron Device Letters, IEEE >In-Plane-Gate Oxide-Based Thin-Film Transistors Self-Aligned on Stacked Self-Assembled Monolayer/$hbox{SiO}_{2}$ Electrolyte Dielectrics
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In-Plane-Gate Oxide-Based Thin-Film Transistors Self-Aligned on Stacked Self-Assembled Monolayer/$hbox{SiO}_{2}$ Electrolyte Dielectrics

机译:在堆叠自组装单层/ $ hbox {SiO} _ {2} $电解质电介质上自对准的基于平面栅极氧化物的薄膜晶体管

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Low-voltage oxide-based thin-film transistors (TFTs) gated by stacked self-assembled octadecylphonic acid (ODPA) monolayer/$hbox{SiO}_{2}$ electrolyte with an in-plane-gate structure are self-aligned by one nickel shadow mask at room temperature. The stacked gate dielectrics show a reduced gate leakage current with the aid of the well-organized dense-stacked ODPA monolayer buffer. The equivalent field-effect mobility, subthreshold voltage swing, and drain current on/off ratio of such TFTs are estimated to be 11 $hbox{cm}^{2}/hbox{V}cdothbox{s}$, 140 mV/dec, and $hbox{10}^{6}$, respectively. Such low-voltage in-plane-gate TFTs are very promising for low-cost portable sensors.
机译:由面内栅极结构的堆叠式自组装十八烯酸(ODPA)单层/ $ hbox {SiO} _ {2} $电解质进行选通的低压氧化物基薄膜晶体管(TFT)在室温下一个镍荫罩。堆叠的栅极电介质借助于组织良好的密集堆叠的ODPA单层缓冲器显示出降低的栅极泄漏电流。此类TFT的等效场效应迁移率,亚阈值电压摆幅和漏极电流开/关比估计为11 $ hbox {cm} ^ {2} / hbox {V} cdboxbox {s} $,140 mV / dec ,和$ hbox {10} ^ {6} $。对于低压便携式传感器而言,这种低压平面栅极TFT很有前景。

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