Numerical Investigation on Uniformity Improvement of the Microwave Power Absorption in a Planar Type Surface Wave Plasma Processing Device

摘要

The characteristics of microwave power absorption in a planar type surface wave plasma (SWP) processing device are numerically analyzed for realizing uniform power absorption. In the numerical analysis, the finite difference time domain (FDTD) method is used for 2 dimensional cold electron plasma. The performance of microwave power absorption is investigated in terms of uniformity and efficiency of the power absorption.