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Effect of direct fluorination on surface partial discharge characteristics of polyimide films

机译:直接氟化对聚酰亚胺薄膜表面局部放电特性的影响

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摘要

Surface charge accumulation induced by partial discharge has a great effect on breakdown characteristics of polymer insulation. By changing the chemical component in the surface layer of insulation material, fluorination will cause the corresponding change in electrical property. This paper presents a study aimed at clarifying the effect of fluorination time on the partial discharge of fluorinated polyimide (PI) film. PI samples were fluorinated in a reaction kettle at about 328 K (55 u000b0;C) using a F2/N2 blend with volume fraction of 20% nitrogen and 0.05 MPa (500 mbar) for respectively 15, 30, 45, 60 and 90 min. The partial discharge experiment was tested at room temperature with the relative humidity of ~ 40%. A wideband detection system and a video recorder were employed to detect the partial discharge current and record discharge images in a shielding darkroom. Obtained results show that the conductivity of polyimide film becomes large after the fluorination. The corona resistance time increases with the fluorination time increases from 0 to 45 min, while it decreases when the fluorination time increases from 45 to 90 min. Recurrent plot (RP) analysis of discharge current shows that the change of chemical component in surface layer of polyimide film by fluorination makes the partial discharge become more stable and regular.
机译:由局部放电引起的表面电荷积累对聚合物绝缘的击穿特性有很大的影响。通过改变绝缘材料表层中的化学成分,氟化会引起电性能的相应变化。本文提出了旨在阐明氟化时间对氟化聚酰亚胺(PI)薄膜局部放电的影响的研究。使用体积分数为20%的氮气和0.05 MPa(500 mbar)的F2 / N2共混物,在约328 K(55 u000b0; C)的反应釜中将PI样品氟化15、30、45、60和90分钟。在室温下以〜40%的相对湿度测试了局部放电实验。宽带检测系统和录像机用于检测局部放电电流并在屏蔽暗室中记录放电图像。所得结果表明,氟化后聚酰亚胺膜的电导率变大。耐电晕时间随氟化时间从0增加到45分钟而增加,而随氟化时间从45分钟增加到90分钟而减少。放电电流的回归图分析表明,氟化作用使聚酰亚胺膜表面层化学成分的变化,使局部放电更加稳定和规则。

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