Metallic Color Filter Fabrication using Photo-Curable Polymer Stacking

摘要

Nanoimprint lithography (NIL) can be used as a tool for three-dimensional nanoscale fabrication. In particular, complex metal pattern structures in polymer material are demanded as plasmonic effect devices and metamaterials. To fabricate of metallic color filter, we used silver ink and liquid-transfer imprint lithography (LTIL) techniques. Metallic color filter was composed of stacking of nanoscale silver disc patterns and polymer layers, thus, controlling of polymer layer thickness is necessary. To control of thickness of polymer layer, we used spin-coating of UV-curable polymer and LTIL process. To obtain silver disc pattern, we used silver ink, Ultraviolet NIL technique and LTIL process. As a result, ten stacking layers with 1000 nm layer thickness was obtained and red color was observed. The obtained colors are generated from plasmon phenomenon. This process is very useful to make stacking structure without vacuum environment.