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Interaction of SO2 with Oxygen on Ni(100) Studied by XPS and NEXAFS

机译:XPS和NEXAFS研究SO 2 与氧在Ni(100)上的相互作用

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The adsorption and surface reactions of SO2 on Ni(100), c(2x2)_O/Ni (100) and NiO(111)/Ni(100) surfaces have been investigated using X-ray photoelectron spectroscopy (XPS) and near-edge X-ray absorption fine structure (NEXAFS) technique. On Ni(100), chemisorbed SO2 is formed at 160 K. When SO2 is adsorbed on c(2x2)_O/Ni(100) at 160 K, SO2 reacts with oxygen to form SO3 and trace amount of SO4 species. SO3 is adsorbed on this surface with its C3 axis perpendicular to the surface. On a NiO(111)/Ni(100) surface, both SO3 and SO4 species are formed at 160 K from adsorbed SO2.
机译:使用X射线光电子能谱(XPS)和近边缘研究了SO2在Ni(100),c(2x2)_O / Ni(100)和NiO(111)/ Ni(100)表面上的吸附和表面反应X射线吸收精细结构(NEXAFS)技术。在Ni(100)上,在160 K下形成化学吸附的SO2。当SO2在160 K上吸附在c(2x2)_O / Ni(100)上时,SO2与氧气反应形成SO3和痕量的SO4。 SO 3以其C 3轴垂直于该表面的方式吸附。在NiO(111)/ Ni(100)表面上,在160 K处由吸附的SO2形成SO3和SO4物种。

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