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A Study of the Optical Conductivity, ExtinctionCoefficient and Dielectric Function of CdO bySucessive Ionic Layer Adsorption and Reaction(SILAR) Techniques

机译:连续离子层吸附和反应技术研究CdO的电导率,消光系数和介电功能

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Aims: The research is to study the Optical Conductivity, Extinction Coefficient and Dielectric function using deposited CdO films Place and Duration of Study: The research place is at the Material Science and Nanotechnology Unit, Department of Physics and Astronomy, University of Nigeria Nsukka, between of August 2012 to June 2013.Methodology: The approach used in the deposition of CdO is the Solution Method, known as the Successive Ionic Layer Adsorption and Reaction techniques (SILAR) Technique and the UV-VIS-NIR spectroscopy was used for film characterization.Results: The deposited CdO thin film has a low and high transmittance in the UV and visible region respectively. The band gap of the deposited CdO decreases with an increase in No. of cycles films and ranges from 1.45eV – 2.35eV, this was attributed to the increase in the thickness of films. Also studied is the variation of the film optical conductivity with the band gap, which was observed to decrease with an increase in band gap. Lastly, the relationship between the film band gap and the dielectric function of the materials was consider, the dielectric constant varies exponentially with the band gap and also increases with the number of cycles (film thickness).
机译:目的:本研究旨在使用沉积的CdO薄膜研究光导率,消光系数和介电功能。研究地点和持续时间:研究地点在尼日利亚Nsukka大学物理与天文学系材料科学与纳米技术部门之间。方法:2012年8月至2013年6月。方法:用于沉积CdO的方法是溶液法,称为连续离子层吸附和反应技术(SILAR)技术,并使用UV-VIS-NIR光谱进行膜表征。结果:沉积的CdO薄膜分别在紫外线和可见光区域具有低透射率和高透射率。沉积的CdO的带隙随循环数的增加而减小,范围为1.45eV – 2.35eV,这是由于膜厚度的增加所致。还研究了薄膜光导率随带隙的变化,观察到随着带隙的增加而减小。最后,考虑了薄膜带隙与材料介电函数之间的关系,介电常数随带隙呈指数变化,并且随着循环次数(膜厚)的增加而增大。

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