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Fracture toughness improvements of dental ceramic through use of yttria-stabilized zirconia (YSZ) thin-film coatings

机译:通过使用氧化钇稳定的氧化锆(YSZ)薄膜涂层改善牙科陶瓷的断裂韧性

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摘要

Objectives. The aim of this study was to evaluate strengthening mechanisms of yttria-stabilized zirconia (YSZ) thin film coatings as a viable method for improving fracture toughness of all-ceramic dental restorations. Methods. Bars (2 mm x 2 mm x 15 mm, n = 12) were cut from porcelain (ProCAD, Ivoclar-Vivadent) blocks and wet-polished through 1200-grit using SiC abrasive. A Vickers indenter was used to induce flaws with controlled size and geometry. Depositions were performed via radio frequency magnetron sputtering (5 mT, 25 ℃, 30:1 Ar/O_2 gas ratio) with varying powers of substrate bias. Film and flaw properties were characterized by optical microscopy, scanning electron microscopy (SEM), and X-ray diffraction (XRD). Flexural strength was determined by three-point bending. Fracture toughness values were calculated from flaw size and fracture strength. Results. Data show improvements in fracture strength of up to 57% over unmodified specimens. XRD analysis shows that films deposited with higher substrate bias displayed a high %monoclinic volume fraction (19%) compared to non-biased deposited films (87%), and resulted in increased film stresses and modified YSZ microstructures. SEM analysis shows critical flaw sizes of 67 ± 1 μm leading to fracture toughness improvements of 55% over unmodified specimens. Significance. Data support surface modification of dental ceramics with YSZ thin film coatings to improve fracture toughness. Increase in construct strength was attributed to increase in compressive film stresses and modified YSZ thin film microstructures. It is believed that this surface modification may lead to significant improvements and overall reliability of all-ceramic dental restorations.
机译:目标。这项研究的目的是评估氧化钇稳定的氧化锆(YSZ)薄膜涂层的增强机制,作为提高全瓷牙修复体断裂韧性的可行方法。方法。从瓷块(ProCAD,Ivoclar-Vivadent)上切下条(2 mm x 2 mm x 15 mm,n = 12),并使用SiC磨料湿抛光至1200目。使用维氏压头来诱导尺寸和几何形状受控的缺陷。通过射频磁控溅射(5 mT,25℃,Ar / O_2气体比为30:1)以不同的衬底偏置功率进行沉积。通过光学显微镜,扫描电子显微镜(SEM)和X射线衍射(XRD)表征薄膜和缺陷性能。抗弯强度由三点弯曲确定。断裂韧性值由缺陷尺寸和断裂强度计算得出。结果。数据显示,与未改性的试样相比,断裂强度提高了57%。 XRD分析表明,与无偏压沉积膜(87%)相比,以较高的基底偏压沉积的膜显示出较高的%单斜晶体积分数(19%),并导致膜应力增加和YSZ微观结构改变。 SEM分析显示临界缺陷尺寸为67±1μm,与未改性样品相比,断裂韧性提高了55%。意义。使用YSZ薄膜涂层对牙科陶瓷进行数据支持的表面改性,以提高断裂韧性。构造强度的增加归因于压缩膜应力和改良的YSZ薄膜微结构的增加。据信,这种表面改性可以导致全瓷牙修复体的显着改善和整体可靠性。

著录项

  • 来源
    《Dental materials》 |2013年第8期|881-887|共7页
  • 作者单位

    North Carolina State University, Department of Materials Science and Engineering, 911 Partner's Way, EB1 Room 3002, Raleigh, NC 27695, United States,RTI International, Center for Materials and Electronic Technologies, PO Box 12194, 3040 Cornwallis Road RTP, NC 27709, United States;

    RTI International, Center for Materials and Electronic Technologies, PO Box 12194, 3040 Cornwallis Road RTP, NC 27709, United States;

    Noua Southeastern University, Section of Prosthodontics, 3301 College Avenue, Fort Lauderdale, FL 33328, United States;

    North Carolina State University, Department of Materials Science and Engineering, 911 Partner's Way, EB1 Room 3002, Raleigh, NC 27695, United States;

    North Carolina State University, Department of Materials Science and Engineering, 911 Partner's Way, EB1 Room 3002, Raleigh, NC 27695, United States,RTI International, Center for Materials and Electronic Technologies, PO Box 12194, 3040 Cornwallis Road RTP, NC 27709, United States;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Dental material; Fracture toughness; Thin film; Zirconia; All-ceramic; Failure; Stress;

    机译:牙科材料断裂韧性;薄膜;氧化锆全瓷;失败;强调;
  • 入库时间 2022-08-18 03:47:03

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