机译:饰面烤瓷厚度和冷却速率对氧化锆磨牙冠残余应力的影响
Sir John Walsh Research Institute, University of Otago, Dunedin, New Zealand,Department of Oral Rehabilitation, Faculty of Dentistry, PO Box 647, Dunedin 9054, New Zealand;
Sir John Walsh Research Institute, University of Otago, Dunedin, New Zealand;
Sir John Walsh Research Institute, University of Otago, Dunedin, New Zealand;
Sir John Walsh Research Institute, University of Otago, Dunedin, New Zealand;
Zirconia; Porcelain; Crowns; Residual stresses; Chipping; Thickness of veneer; Cooling protocol; Vickers indentation;
机译:瓷胶合氧化锆牙冠残留应力的粘弹性有限元分析
机译:使用改进的测试装置对瓷面金合金和氧化锆磨牙冠进行断裂
机译:瓷质氧化锆假体的残余应力
机译:塑料厚度对全陶瓷冠胁迫的影响
机译:全瓷修复的瓷贴面层中的残余应力
机译:瓷贴面氧化锆牙冠残余应力的粘弹性有限元分析
机译:瓷胶合氧化锆牙冠残留应力的粘弹性有限元分析