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A hybrid density/level set formulation for topology optimization of functionally graded lattice structures

机译:用于功能分级晶格结构的拓扑优化混合密度/级别配方

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Additive manufacturing is capable of producing lightweight structures by introducing mesoscale lattice structures in the design without significant additional manufacturing costs. Nevertheless, designing efficient structures including complex lattices remains a challenging task. This paper presents a strategy for the design of additively manufactured structures that is able to simultaneously optimize the shape of the macroscale structure and the functionally graded lattices inside this design. Assuming a separation of scales between the lattice cell size and the macroscale structure, an effective material model based on numerical homogenization is adopted to model the lattice behavior in the analysis of the macroscale structure. While this material model is parametrized by volume densities to mimic functionally graded lattices, the shape of the macroscale structure is represented by a level set function and modeled by the extended finite element method inside the design domain. By adopting an explicit approach to the level set optimization the design problem can be formulated as a single nonlinear programming problem which can be solved with standard optimization algorithms for topology optimization. The proposed formulation avoids degenerate lattice members by excluding small densities in the optimization. Furthermore, the distinct representation of the macroscale structure enables to easily include geometric constraints on the macroscale level such as a minimum feature size or other constraints specific to the additive manufacturing process. The effectiveness of the method is demonstrated in a number of examples. (C) 2020 Elsevier Ltd. All rights reserved.
机译:添加剂制造能够通过在设计中引入Mescle晶格结构而没有显着的额外制造成本来产生轻质结构。尽管如此,设计包括复杂格子的高效结构仍然是一个具有挑战性的任务。本文介绍了一种设计的策略,该策略能够同时优化宏观结构的形状和这种设计内的功能分级格格。假设晶格电池尺寸与宏观结构之间的尺度分离,采用基于数值均匀化的有效材料模型来模拟晶格行为在宏观结构的分析中。虽然该材料模型由体积密度参加模拟功能分级晶格,但是Macroscale结构的形状由电平集功能表示,并由设计域内的扩展有限元方法建模。通过采用明确的级别设置优化方法,可以将设计问题作为单一非线性编程问题,可以用标准优化算法来解决拓扑优化的标准优化算法。所提出的制剂通过在优化中排除小密度来避免退化的格子成员。此外,宏观结构的不同表示使得能够容易地包括在诸如最小特征尺寸或特定于添加剂制造过程的其他约束的几何约束。该方法的有效性在许多实施例中证明。 (c)2020 elestvier有限公司保留所有权利。

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