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Experimental and theoretical studies of the physicochemical and mechanical properties of multi-layered TiN/SiC films: Temperature effects on the nanocomposite structure

机译:TiN / SiC多层膜的物理化学和力学性能的实验和理论研究:温度对纳米复合结构的影响

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Nanoscale multilayered TiN/SiC films are of great importance in many electronic and industrial fields. The careful control over the structure of the laminates, nanocrystalline or amorphous, is crucial for their further applicability and study. However, several limitations in their fabrication have revealed important gaps in the understanding of this system. Here, we study influence of temperature on the physico-chemical and functional properties of TiN/SiC multilayers. We will show the clear increment on hardness of the samples, while the nanocomposite structure of the layers is maintained with no increment in crystal size. We will investigate the interstitial effects and rearrangements, between the TIN/SiC phases and their role in the enhanced mechanical response. Our experiments will dearly show a change in the modulation period of the samples, pointing to interfacial reactions, diffusion of ions or crystallization of new phases. Full Investigations of the film properties were carried out using several methods of analysis: XRD, XPS, FTIR, HR-TEM and SIMS Additionally, results were combined with First Principles MD computations of TiN/SiC heterostructures.
机译:纳米多层TiN / SiC膜在许多电子和工业领域中都非常重要。仔细控制层压材料的结构,无论是纳米晶体还是无定形,对于它们的进一步应用和研究都是至关重要的。但是,它们制造过程中的一些局限性揭示了在对该系统的理解上的重要差距。在这里,我们研究温度对TiN / SiC多层膜的物理化学和功能特性的影响。我们将显示样品硬度的明显增加,而各层的纳米复合结构将保持不变,而晶体尺寸不会增加。我们将研究TIN / SiC相之间的间隙效应和重排及其在增强机械响应中的作用。我们的实验将清楚地显示出样品的调制周期发生变化,表明界面反应,离子扩散或新相结晶。使用多种分析方法对薄膜性能进行了全面研究:XRD,XPS,FTIR,HR-TEM和SIMS。此外,将结果与TiN / SiC异质结构的第一原理MD计算相结合。

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