Fine Lines in High Yield (Part CLVI)

摘要

recently reviewed my files on defect problems associated with the development of dry-film photoresist and found some that I had not yet dis- cussed in Tech Talk. At the same time I noticed a short report on the use of the development process to remedy a potential problem that originates in the cut sheet laminator. Many improvements in equipment design and equipment maintenance have reduced the number of defects that are associated with development: the so-called contact-less transport systems, the replacement of exit squeegee rollers by air knives, the elimination of antifoam through the use of an overflow weir, and sprays that knock down the foam.