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Cathodic micro-arc electrodeposition of yttrium stabilized zirconia (YSZ) coatings on FeCrAl alloy

机译:FeCrAl合金上的钇稳定氧化锆(YSZ)涂层的阴极微弧电沉积

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摘要

The formation of ceramic coatings on metal substrate by cathodic electrolytic deposition (CELD) has received more attention in recent years. But only thin films can be prepared via CELD. Yttrium stabilized zirconia (YSZ) ceramic coatings were deposited on FeCrAl alloy by a novel technique-cathodic micro-arc electrodeposition (CMED). The result shows that, when a high pulse electric field is applied to the cathode which was pre-deposited with a thin YSZ film, dielectric breakdown occurs and micro-arc discharges appear. Coatings with reasonably thickness of ~300 μm and crystalline structure can be deposited on the cathode by utilizing the energy of the micro-arc. The thickness of the as-deposited coating is dominated by the voltage and the frequency. Y_2O_3 is co-deposited with ZrO_2 when Y(NO_3)_3 was added to the electrolyte, which stabilize t-phase, t'-phase and c-phase of ZrO_2 at room temperature. The amount of the m-ZrO_2 in the coating is diminished by increasing the concentration of Y(NO_3)_3 in the electrolyte. This report describes the processing of CMED and studies the microstructure of the deposited YSZ coatings.
机译:近年来,通过阴极电解沉积(CELD)在金属基材上形成陶瓷涂层已引起更多关注。但是只能通过CELD制备薄膜。钇稳定氧化锆(YSZ)陶瓷涂层通过一种新技术-阴极微弧电沉积(CMED)沉积在FeCrAl合金上。结果表明,当高脉冲电场施加到预先沉积有薄YSZ薄膜的阴极上时,会发生介电击穿并出现微电弧放电。利用微弧的能量,可以在阴极上沉积厚度约为300μm且具有晶体结构的涂层。沉积涂层的厚度由电压和频率决定。当向电解液中添加Y(NO_3)_3时,Y_2O_3与ZrO_2共沉积,从而在室温下稳定ZrO_2的t相,t'相和c相。通过增加电解质中Y(NO_3)_3的浓度可以减少涂层中m-ZrO_2的含量。该报告描述了CMED的加工过程,并研究了沉积的YSZ涂层的微观结构。

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