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Preparation and characterization of LaNiO3 films grown by metal-organic deposition

机译:金属有机沉积生长LaNiO 3 薄膜的制备与表征

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We have investigated the synthesis and characterization of LaNiO3 (LNO) layers deposited on YSZ (100) substrate by metal-organic deposition (MOD). Texture, morphology and electrical properties of the LaNiO3 films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and electrical resistivity measurement. It has been found that the formation of (h00) orientation depends on pyrolysis temperature, annealing temperature and thickness of LaNiO3 layers. The LaNiO3 films prepared under optimal condition indicate highly (h00) orientation and a rather smooth surface. The LaNiO3 films show a metallic behaviour in the measured temperature range.
机译:我们研究了通过金属有机沉积(MOD)沉积在YSZ(100)衬底上的LaNiO 3 (LNO)层的合成和表征。通过X射线衍射(XRD),原子力显微镜(AFM),扫描电子显微镜(SEM)和电阻率测量对LaNiO 3 薄膜的织构,形貌和电性能进行了表征。已经发现(h00)取向的形成取决于热解温度,退火温度和LaNiO 3 层的厚度。在最佳条件下制备的LaNiO 3 薄膜表现出高度(h00)取向和相当光滑的表面。 LaNiO 3 膜在测得的温度范围内表现出金属行为。

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