Surface characterization of plasma deposited organic thin films

摘要

This article reviews advances in characterizing the chemical and physical properties of organic plasma deposited films (PDFs). The text focuses on insights provided by X-ray photoelectron spectroscopy (XPS), secondary ion mass spectro-metry (SIMS), contact angle goniometry, atomic force microscopy (AFM), infrared spectroscopy, near edge X-ray absorption fine structure (NEXAFS), and surface chemical derivatization. Alone and in combination, these techniques help us understand the relationship between plasma deposition parameters and PDF properties such as surface chemistry, crosslinking, mobility, roughness, and molecular orientation. We also comment upon refinements in these analytical techniques that will enhance our ability to characterize PDFs in the future.