首页> 外文期刊>Journal of Electron Spectroscopy and Related Phenomena >Valence band offset and interface formation of Ge/ZnSe(100) studied by synchrotron radiation photoemission
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Valence band offset and interface formation of Ge/ZnSe(100) studied by synchrotron radiation photoemission

机译:同步加速器辐射光发射研究Ge / ZnSe(100)的价带偏移和界面形成

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摘要

The formation and band lineup of the Ge/ZnSe(100) interface have been studied by synchrotron radiation photoemission spectroscopy. Core level intensity measurements from the ZnSe substrate as well as from the Ge overlayer show a two-dimensional deposition of Ge film. Core level spectra indicate that Ge atoms react with Se atoms slightly at the interface. We derive a valence band offset of 1.76 ± 0.1eV for Ge/ZnSe(100).
机译:Ge / ZnSe(100)界面的形成和能带排列已通过同步加速器辐射光发射光谱进行了研究。来自ZnSe衬底以及来自Ge覆盖层的核心能级强度测量结果显示了Ge膜的二维沉积。核心能级谱表明,Ge原子与Se原子在界面处发生轻微反应。我们得出Ge / ZnSe(100)的价带偏移为1.76±0.1eV。

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