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The use of Valencia applicators at extended source surface distances for irregular surface contours

机译:在延长的源表面距离处使用瓦伦西亚喷枪处理不规则的表面轮廓

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The use of Valencia applicators across irregular surface contours results in significant dose heterogeneities at the prescription depth. Investigations were carried out using extended source surface distances (standoff) to reduce these dose heterogeneities. Relative output factors were measured with a Roos chamber and Gafchromic EBT3 film was used to measure profiles and percentage depth doses at numerous standoff distances. The use of 20 mm standoff was found to reduce the relative difference in delivered dose across a 4 mm change in surface contour by 10.6 % for the H2 applicator and 10.0 % for the H3 applicator. The radiation became more penetrating with standoff and the field size larger, as expected. The results show that standoff can be used with the Valencia applicator to reduce dose heterogeneities across changes in surface contour.
机译:在不规则的表面轮廓上使用Valencia涂抹器会导致处方深度处出现明显的剂量异质性。使用扩展的源表面距离(间距)进行了研究,以减少这些剂量的异质性。相对输出因子在Roos腔室中进行测量,而Gafchromic EBT3膜用于在许多间隔距离处测量轮廓和深度剂量百分比。发现使用20 mm的支座可减少H2施加器在表面轮廓4 mm变化时输送剂量的相对差异10.6%,H3施加器10.0%。辐射随着距离的增加而变得更加穿透,并且像预期的那样,场的尺寸更大。结果表明,可以与Valencia喷枪一起使用支座,以减少表面轮廓变化时的剂量异质性。

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