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首页> 外文期刊>Applied Surface Science >2D anisotropic type-Ⅰ SiS vdW heterostructures toward infrared polarized optoelectronics applications
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2D anisotropic type-Ⅰ SiS vdW heterostructures toward infrared polarized optoelectronics applications

机译:2D各向异性Ⅰ型SIS VDW异质结构朝红外偏振光电子应用

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摘要

Two-dimensional (2D) SiS has been drawing much attention due to its direct band gap and strong optical anisotropy under both two structural phases, namely, Pmma-SiS and Pma2-SiS. Here, we theoretically design Pmma-/Pma2-SiS van der Waals heterostructures (vdWH) through first-principles for the application of polarized light emitting devices. The calculations show that 2D Pmma-/Pma2-SiS vdWH possesses direct type-I band alignment with suitable band offsets (Delta Ec = 0.163 eV, Delta Ev = 0.202 eV), strong linear dichroism and high optical absorptions (similar to 105 cm(-1)). Moreover, type-II band alignment with direct band gap can be achieved with the effect of external electric field, separating spatially the low-energy electron-hole pairs. Further, the band offsets display linear increase with the increase of external electric field, which indicates the recombination of charge carriers can be easily modulated. These results imply that Pmma-/Pma2-SiS vdWH can provide a promising way to design polarized infrared light emitting devices through using 2D anisotropic materials to form vdWH with type-I band alignment.
机译:二维(2D)SIS由于其两种结构阶段,即PMMA-SIS和PMA2-SIS下的直接带隙和强光学各向异性而引起了很多关注。在这里,通过第一原理理论上设计PMMA-/ PMA2-SIS范德瓦尔斯(VDWH),用于施加偏振光器件。计算结果表明,2D PMMA-/ PMA2-SIS VDWH具有直接类型-I频段对准与合适的带偏移(Delta EC = 0.163eV,Delta EV = 0.202eV),强线性二数分和高光吸收(类似于105厘米( -1))。此外,通过外部电场的效果,可以实现与直接带隙的II型带对准,在空间上分离低能量电子孔对。此外,频带偏移随着外部电场的增加显示线性增加,这表明可以容易地调制电荷载波的重组。这些结果意味着PMMA-/ PMA2-SIS VDWH可以通过使用2D各向异性材料来设计偏振红外发光器件的有希望的方式,以形成具有I型带对准的VDWH。

著录项

  • 来源
    《Applied Surface Science》 |2020年第1期|147026.1-147026.8|共8页
  • 作者单位

    Henan Normal Univ Coll Phys & Mat Sci Henan Key Lab Photovolta Mat Xinxiang 453007 Henan Peoples R China;

    Henan Normal Univ Coll Phys & Mat Sci Henan Key Lab Photovolta Mat Xinxiang 453007 Henan Peoples R China;

    Henan Normal Univ Coll Phys & Mat Sci Henan Key Lab Photovolta Mat Xinxiang 453007 Henan Peoples R China;

    Henan Normal Univ Coll Phys & Mat Sci Henan Key Lab Photovolta Mat Xinxiang 453007 Henan Peoples R China;

    Henan Normal Univ Coll Phys & Mat Sci Henan Key Lab Photovolta Mat Xinxiang 453007 Henan Peoples R China;

    Taiyuan Univ Technol Coll Mat Sci & Engn Taiyuan 030024 Shanxi Peoples R China;

    Taiyuan Univ Technol Coll Mat Sci & Engn Taiyuan 030024 Shanxi Peoples R China;

    Taiyuan Univ Technol Coll Mat Sci & Engn Taiyuan 030024 Shanxi Peoples R China;

    Taiyuan Univ Technol Coll Mat Sci & Engn Taiyuan 030024 Shanxi Peoples R China;

    Henan Normal Univ Coll Phys & Mat Sci Henan Key Lab Photovolta Mat Xinxiang 453007 Henan Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Anisotropic; 2D SiS; Light emitting applications;

    机译:各向异性;2D SIS;发光应用;

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