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An analytical method to determine the complex refractive index of an ultra- thin film by ellipsometry

机译:椭圆偏振法测定超薄膜复折射率的分析方法

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摘要

We proposed a completely analytical method to determine the complex refractive index of an ultra-thin film on an arbitrary substrate by ellipsometry. The method is based on directly solving the polynomial equation derived from the 2nd-order Taylor expansion of ellipsometric functions without any prior knowledge about electronic transitions of the material. Numerical simulations demonstrate that the proposed method can be applied to deal with ultra-thin films with a wide thickness range from a single atomic layer to 5 nm over an ultra-broad spectral range from deep ultraviolet to infrared regions. With the proposed method, complex refractive indices of typical two-dimensional (2D) materials, including the monolayer graphene and 1-3 layer WSe2, were experimentally investigated over an ultra-wide spectral range (193-1690 nm). The proposed method shows great potential in the accurate determination of complex refractive indices of ultra-thin films especially the emerging 2D materials.
机译:我们提出了一种完全分析的方法,通过椭圆偏振法测定任意基材上的超薄膜的复折射率。该方法基于直接求解从椭圆函数的二阶泰勒展开式导出的多项式方程式,而无需任何关于材料的电子跃迁的先验知识。数值模拟表明,所提出的方法可用于处理从单原子层到5 nm的较宽厚度范围的薄膜,该薄膜在从深紫外到红外区域的超宽光谱范围内。使用提出的方法,在超宽光谱范围(193-1690 nm)上对包括单层石墨烯和1-3层WSe2在内的典型二维(2D)材料的复折射率进行了实验研究。该方法在准确测定超薄膜尤其是新兴的二维材料的复折射率方面显示出巨大的潜力。

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