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Electrodeposited superhydrophobic mesoporous silica films co-embedded with template and corrosion inhibitor for active corrosion protection

机译:与模板和缓蚀剂共同包埋的电沉积超疏水介孔二氧化硅膜,具有主动防腐蚀功能

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摘要

We fabricate an inhibitor (benzotriazole, BTA)-loaded mesoporous silica film by one-step electrodeposition on aluminum alloy AA2024 substrate and further produce superhydrophobicity after surface modification with dodecyltrimethoxysilane (DTMS). Cetyltrimethyl ammonium bromide (CTAB) is used both as a template to form mesoporous structure of silica film and as a carrier to encapsulate BTA into mesopores. One-step electrodeposition avoids utilization of organic solvents and other complex steps (e.g. removal of template agents and post-loading of inhibitors). The release of inhibitor is pH-responded, making superhydrophobic film a smart and active protection system.
机译:我们通过一步法在铝合金AA2024基板上进行电沉积来制备负载抑制剂(苯并三唑,BTA)的介孔二氧化硅膜,并在用十二烷基三甲氧基硅烷(DTMS)进行表面改性后进一步产生超疏水性。十六烷基三甲基溴化铵(CTAB)既可以用作形成二氧化硅膜中孔结构的模板,也可以用作将BTA包封到中孔中的载体。一步电沉积避免了有机溶剂和其他复杂步骤的利用(例如去除模板剂和后装抑制剂)。抑制剂的释放受pH响应,使超疏水膜成为一种灵巧,主动的保护系统。

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