机译:Ar〜+离子辐照诱导单晶LiNbO_3薄膜的忆阻行为和神经形态计算
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China|Univ Hamburg, Dept Informat, Inst Tech Aspects Multimodal Syst TAMS, D-22527 Hamburg, Germany;
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;
Univ Elect Sci & Technol China, Ctr Robot, Chengdu 611731, Sichuan, Peoples R China;
Univ Elect Sci & Technol China, Ctr Robot, Chengdu 611731, Sichuan, Peoples R China;
Univ Elect Sci & Technol China, Ctr Robot, Chengdu 611731, Sichuan, Peoples R China;
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;
Univ Hamburg, Dept Informat, Inst Tech Aspects Multimodal Syst TAMS, D-22527 Hamburg, Germany;
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China;
Fraunhofer Inst Elektron Nanosyst, Abt Back End Line, Techn Campus 3, D-09126 Chemnitz, Germany;
Fraunhofer Inst Elektron Nanosyst, Abt Back End Line, Techn Campus 3, D-09126 Chemnitz, Germany|Leibniz Inst Photon Technol eV IPHT, Albert Einstein Str 9, D-07745 Jena, Germany;
Single-crystalline thin film; LiNbO3; Ion-irradiation; Memristor; Neuromorphic computing;
机译:Ar〜+离子辐照诱导椎间型LINBO_3薄膜中的椎间盘性能和神经形态计算
机译:AR〜+辐照对基于单晶LINBO_3薄膜的忆耳仪性能的影响
机译:室温下500 keV Ar2 +离子辐照诱导TiO2薄膜中锐钛矿到板钛矿相变和铁磁性
机译:膜厚对旋涂二氧化钛薄膜忆阻行为的影响
机译:离子辐照引起介电基片上金属膜的粗糙化和平滑化。
机译:椎间膜神经晶体器件制造的一种新方法:合成梯度薄膜
机译:具有非理想忆阻器件的内存计算的神经形态系统方法:从缓解到剥削