首页> 外文期刊>Applied Surface Science >ITO/A1N rod-based hybrid electrodes: effect of buffer layers in AlN rods on performance of 365-nm light-emitting diodes
【24h】

ITO/A1N rod-based hybrid electrodes: effect of buffer layers in AlN rods on performance of 365-nm light-emitting diodes

机译:ITO / A1N棒状混合电极:AlN棒中的缓冲层对365 nm发光二极管性能的影响

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

In this study, hybrid electrodes consisting of AlN rod arrays and surrounding indium tin oxide (ITO) films are proposed, and the effect of buffer layers in AlN rods on the performance of 365-nm light-emitting diodes (LEDs) is investigated. The AlN rod arrays were introduced in the form of ITO/AlN/buffer layers (Cr/Ni or thin ITO) to reduce the area and voltage for electrical breakdown (EBD), which is used to form conductive channels. The surrounding ITO film was used as a current spreading layer. Using this electrode design, we observed improved ohmic behavior and a higher transmittance at 365 nm compared to those of the reference ITO. In addition, both conduction and ohmic conduction mechanisms in the structure comprising a metal, AlN rod film, and p-AlGaN surface were investigated using various analysis tools. As a result, the 365-nm LEDs with thin Cr/Ni buffer layers exhibited a significantly higher light output power, lower forward voltages, and lower leakage currents than the LEDs with thin ITO buffer layers and reference ITOs. (c) 2017 Elsevier B.V. All rights reserved.
机译:在这项研究中,提出了由AlN棒阵列和周围的铟锡氧化物(ITO)膜组成的混合电极,并研究了AlN棒中的缓冲层对365 nm发光二极管(LED)性能的影响。以ITO / AlN /缓冲层(Cr / Ni或薄ITO)的形式引入AlN棒阵列,以减少用于电击穿(EBD)的面积和电压,该电击穿用于形成导电通道。周围的ITO膜用作电流扩散层。使用这种电极设计,与参考ITO相比,我们观察到在365 nm处具有改善的欧姆性能和更高的透射率。另外,使用各种分析工具研究了包括金属,AlN棒膜和p-AlGaN表面的结构中的导电和欧姆导电机理。结果,与具有薄的ITO缓冲层和参考ITO的LED相比,具有Cr / Ni缓冲层薄的365 nm LED表现出明显更高的光输出功率,更低的正向电压和更低的泄漏电流。 (c)2017 Elsevier B.V.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号