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首页> 外文期刊>Applied Surface Science >Electrical and mechanical properties of surfactant-templated mesoporous silica thin films using Brij-76 surfactant
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Electrical and mechanical properties of surfactant-templated mesoporous silica thin films using Brij-76 surfactant

机译:使用Brij-76表面活性剂的表面活性剂模板介孔二氧化硅薄膜的电气和机械性能

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摘要

Ordered mesoporous silica films using Brij-76 surfactant were prepared from self-assembly of organic-inorganic species and their electrical/mechanical properties were investigated for low-k application. X-ray diffraction pattern revealed highly textured pore structure. Adequate dielectric properties could be realized by controlling the chemical species of silica wall. Porosity of mesoporous silica film was 39 +/- 2% and elastic modulus and hardness of the film were 14.4 and 1.25 GPa, respectively. The dielectric constant and leakage current density were measured as 2.55 and less than 2 x 10(-6) A/cm(2) up to 1.6 MV/cm, respectively. (c) 2004 Elsevier B.V. All rights reserved.
机译:从有机无机物的自组装制备了使用Brij-76表面活性剂的有序介孔二氧化硅膜,并研究了其在低k应用下的电/机械性能。 X射线衍射图显示出高度织构的孔结构。通过控制二氧化硅壁的化学种类,可以实现足够的介电性能。介孔二氧化硅膜的孔隙率为39 +/- 2%,膜的弹性模量和硬度分别为14.4和1.25 GPa。介电常数和泄漏电流密度分别为2.55和小于2 x 10(-6)A / cm(2),最高为1.6 MV / cm。 (c)2004 Elsevier B.V.保留所有权利。

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