Cleaning with water decomposed products obtained by laser irradiation

摘要

ArF excimer laser irradiation can decompose water, and decomposed products contain highly reactive substrates, such as radicals. We propose cleaning using pure water with the aid of water decomposed products obtained by ArF excimer laser irradiation. In this study, the oxidation potential of decomposed products was estimated in metal etching. Then, cleaning of cutting oil was examined. The focal point of the lens used was set at the water surface. Specimens were aligned parallel to the laser beam, so that only decomposed products affected contaminants. As a result, decomposed products could not etch nickel and copper plates, but only zinc plates. Cutting oil was cleaned after 18 000 irradiation pulses. The range of the region cleaned was 5 mm around the focal point. (c) 2006 Elsevier B.V. All rights reserved.