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Effects Of Co-substitution On The Electrical Properties Of Bifeo_3 Thin Films Prepared By Chemical Solution Deposition

机译:共取代对化学溶液沉积制备Bifeo_3薄膜电学性能的影响

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Ferroelectric BiFeO_3 thin films with Nd-Cr (or Sm-Cr) co-substitution (denoted by BNdFCr and BSmFCr, respectively) were deposited on the Pt(2 0 0)/TiO_2/SiO_2/Si(1 0 0) substrates by a chemical solution deposition method. X-ray diffraction patterns revealed the formation of BNdFCr and BSmFCr thin films without any secondary phases. The co-substituted BNdFCr (or BSmFCr) thin films, which were annealed at 550 ℃ for 30 min in N_2 atmosphere, exhibited enhanced electrical properties compared to BFO thin films with the remanent polarization (2P_r) and coercive electric field (2E_c) of 196, 188 μC/cm~2 and 600, 570 kV/cm with the electric field of 800 kV/cm, respectively. The leakage current densities of BNdFCr and BSmFCr thin films measured at room temperature were approximately three orders of magnitude lower than that of BFO thin film, and the leakage current at room temperature of the thin films exhibited three distinctive conduction behaviors. Furthermore, the values of pulse polarizations [i.e., +(P~*-P~^) or - (P~*-P~^)] of BNdFCr and BSmFCr thin films were reasonably unchanged up to 1.4 × 10~(10) switching cycles.
机译:Nd-Cr(或Sm-Cr)共取代的铁电BiFeO_3薄膜(分别由BNdFCr和BSmFCr表示)通过Pt(2 0 0)/ TiO_2 / SiO_2 / Si(1 0 0)衬底沉积。化学溶液沉积法。 X射线衍射图表明没有任何第二相的BNdFCr和BSmFCr薄膜的形成。在N_2气氛中于550℃退火30分钟的共取代BNdFCr(或BSmFCr)薄膜,与剩余极化强度(2P_r)和矫顽电场(2E_c)为196的BFO薄膜相比,具有增强的电性能。分别为188μC/ cm〜2和600、570 kV / cm,电场为800 kV / cm。在室温下测量的BNdFCr和BSmFCr薄膜的漏电流密度比BFO薄膜低大约三个数量级,并且薄膜在室温下的漏电流表现出三种独特的导电行为。此外,BNdFCr和BSmFCr薄膜的脉冲极化值[即+(P〜* -P〜^)或-(P〜* -P〜^)]在1.4×10〜(10)内基本保持不变。切换周期。

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