Substrate Heating Effects On The Propagation Dynamics Of Laser Produced Plume During Pulsed Laser Deposition Of Oxides

摘要

We report on the expansion dynamics of laser-produced plasma plumes of complex oxides in an oxygen atmosphere. In particular, we have studied the combined effects of background gas pressure and substrate heating on the plume propagation in typical pressure and temperature regimes of oxides thin film deposition by pulsed laser deposition. Our results evidence a reduced resistance of the background gas to the plume propagation as the substrate temperature increases. The experimental data are analyzed in the frame of a model describing the plume propagation into the background gas. Our experimental findings clearly indicate that the deposition temperature might influence film growth, not only through its direct thermal effect on the surface kinetics of adatoms, but also by affecting the energetic properties of the precursors in the gas phase.