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Vanadium-Al_2O_3 nanostructured thin films prepared by pulsed laser deposition: Optical switching

机译:脉冲激光沉积制备钒-Al_2O_3纳米结构薄膜:光开关

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摘要

The formation and optical response of VO_x nanoparticles embedded in amorphous aluminium oxide (Al_2O_3) thin films by pulsed laser deposition is studied. The thin films have been grown by alternate laser ablation of V and Al_2O_3 targets, which has resulted in a multilayer structure with embedded nanoparticles. The V content has been varied by changing the number of pulses on the V target. It is found that VO_x nanoparticles with dimensions around 5 nm have been formed. The structural analysis shows that the vanadium nanoparticles are oxidized, although probably there is not a unique oxide phase for each sample. The films show a different optical response depending on their vanadium content. Optical switching as a function of temperature has been observed for the two films with the highest vanadium content, at transition temperatures of about —20 ℃ and 315 ℃ thus suggesting the presence of nanoparticles with compositions V_4O_7 and V_2O_5, respectively.
机译:研究了通过脉冲激光沉积法将无定形氧化铝(Al_2O_3)薄膜中嵌入的VO_x纳米粒子的形成和光学响应。薄膜是通过交替激光烧蚀V和Al_2O_3靶材而生长的,从而形成了带有嵌入式纳米颗粒的多层结构。通过改变V目标上的脉冲数来改变V含量。发现已经形成尺寸约5nm的VO_x纳米颗粒。结构分析表明钒纳米粒子被氧化,尽管每个样品可能没有唯一的氧化物相。薄膜根据钒含量显示出不同的光学响应。在约-20℃和315℃的转变温度下,对于具有最高钒含量的两层薄膜,观察到了随温度的光学转换,因此表明分别存在具有成分V_4O_7和V_2O_5的纳米粒子。

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