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An exploratory study of the effects of the dielectric-barrier-discharge surface pre-treatment on the self-assembly processes of a (3-Aminopropyl) trimethoxysilane on glass substrates

机译:介电势垒放电表面预处理对(3-氨基丙基)三甲氧基硅烷在玻璃基板上自组装过程影响的探索性研究

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摘要

X-ray photoelectron spectrometry (XPS), Fourier transform infrared spectrometry (FTIR), secondary-ion-mass spectrometry (SIMS) and contact angle measurement have been used in study of the enhancement effect of substrate pre-treatment by dielectric-barrier-discharge (DBD) for the self-assembly of a (3-Aminopropyl) trimethoxysilane (APTS) on glass substrates. In results, the concentration of the APTS molecules self-assembled on the surfaces of both the acetone-washed and the DBD-treated substrates were more than three times of that on the as-supplied substrate. Meanwhile, the self-assembly (SA) layers grown on the DBD-treated substrates have the best quality compared to those grown on the substrates pre-treated in other ways in terms of the silane-substrate bonding and the
机译:X射线光电子能谱(XPS),傅里叶变换红外光谱(FTIR),二次离子质谱(SIMS)和接触角测量已用于研究介电势垒放电对基板预处理的增强作用(DBD)用于在玻璃基板上自组装(3-氨基丙基)三甲氧基硅烷(APTS)。结果,在丙酮洗涤和经DBD处理的底物表面上自组装的APTS分子的浓度是所提供底物的三倍以上。同时,与在其他方式进行预处理的基板上生长的自组装(SA)层相比,在硅烷与基板之间的粘合和附着力方面,其质量最高。

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