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Improve the field emission uniformity of carbon nanotubes treated by ball-milling process

机译:通过球磨工艺改善碳纳米管的场发射均匀性

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Carbon nanotubes (CNTs) deposited by chemical vapor deposition (CVD) were treated by ball milling. The morphologies and field emission properties of the treated CNTs depending on milling time were studied. The emission turn-on field is increased, and the field emission current density is reduced, when the milling time increased from 0.5 to 3 h. The as-deposited long CNTs were cut to short CNTs (~1 h) and micro-particles (>1 h) with increasing of the milling time. It is found that the optimized milling time is 0.5-1 h, the treated CNTs showed excellent field emission properties, such as low turn-on field, high emission current density and uniform luminescence spots distribution.
机译:通过球磨处理通过化学气相沉积(CVD)沉积的碳纳米管(CNT)。研究了处理后的碳纳米管的形貌和场发射特性,取决于研磨时间。当研磨时间从0.5 h增加到3 h时,发射导通场增加,场发射电流密度减小。随着研磨时间的增加,沉积的长碳纳米管被切割成短碳纳米管(〜1 h)和微粒(> 1 h)。结果表明,最佳研磨时间为0.5-1 h,处理后的碳纳米管具有良好的场发射性能,如低导通场,高发射电流密度和均匀的发光点分布。

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