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Influence Of Substrate Morphology On Pb Growth

机译:基质形态对铅生长的影响

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The crystallographic structure and morphology of Pb layers in their early stage of growth on Si(335) surface are studied with Reflection High Electron Energy Diffraction (RHEED) and specific resistivity techniques. The vicinal Si(335), with different surface morphology controlled by the amount of predeposiled Au, was used as a substrate. Changes in the substrate morphology, from disordered step distribution through a perfectly ordered Si(335) to a hill-and-valley structure consisting of wide (111) terraces and high Miller index facets, cause switching between one- and two-dimensional growth of the Pb structures.
机译:利用反射高电子能衍射(RHEED)和比电阻率技术研究了Pb层在Si(335)表面生长早期的晶体结构和形态。通过预先沉积的金的量控制具有不同表面形态的相邻Si(335)作为衬底。基板形态的变化,从无序的阶跃分布到完全有序的Si(335)到由宽(111)阶地和高Miller指数小面组成的丘陵和山谷结构,导致一维和二维生长之间的切换。铅的结构。

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