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Surface Modification Of A Wti Thin Film On Si Substrate By nanosecond Laser Pulses

机译:纳秒激光脉冲在Si衬底上Wti薄膜的表面改性

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Interaction of a nanosecond transversely excited atmospheric (TEA) CO_2 laser, operating at 10.6 μm, with tungsten-titanium thin film (190 nm) deposited on silicon of n-type (100) orientation, was studied. Multi-pulse irradiation was performed in air atmosphere with laser energy densities in the range 24-49 J/cm~2. The energy absorbed from the laser beam was mainly converted to thermal energy, which generated a series of effects. The following morphological changes were observed: (ⅰ) partial ablation/exfoliation of the WTi thin film, (ⅱ) partial modification of the silicon substrate with formation of polygonal grains, (ⅲ) appearance of hydrodynamic features including nano-globules. Torch-like plumes started appearing in front of the target after several laser pulses.
机译:研究了工作在10.6μm的纳秒横向激发大气(TEA)CO_2激光器与沉积在n型(100)取向的硅上的钨钛薄膜(190 nm)的相互作用。在空气气氛中以激光能量密度在24-49 J / cm〜2的范围内执行多脉冲照射。从激光束吸收的能量主要转换为热能,产生了一系列效应。观察到以下形态变化:(ⅰ)WTi薄膜的部分烧蚀/剥落;(ⅱ)形成多角形晶粒的硅衬底的部分改性;(ⅲ)包括纳米球的流体动力学特征的出现。几次激光脉冲后,类似火炬的烟羽开始出现在目标前方。

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