Towards laser-manipulated deposition for atom-scale technologies

摘要

We have developed an apparatus for nanostructure fabrication based on direct deposition of laser-manipulated cesium vapors onto pyrolitic graphite. Key features of our apparatus are production and manipulation of a longitudinally cooled atom beam, which allows for straightforward operation in the moderate to low flux density conditions. Both unstructured and structured low surface coverage depositions have been carried out and samples carefully analyzed at the atom scale by in situ tunneling microscopy. Results represent a step forward to the realization of a novel technology for space-controlled deposition of few, eventually single, atoms.